Hunan Huitong Advanced Materials Co., Ltd.
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1μm Metal Filter Element(Nanoscale)for Semi-conductor Process Gas Purification
Product type: Ultrafine 316L stainless steel short fiber
Fiber Diameter: 1um/1.5um/2um available
Cut Length: 80-100um
Chemical Composition of Raw material( Wt% )
|
Elements |
C |
Si |
Mn
|
Ni
|
Cr
|
Mo
|
S
|
P
|
|
Standard
|
≤0.03
|
≤1.00
|
≤2.00
|
10~14
|
16~18
|
2~3
|
≤0.03
|
≤0.045
|
|
Value
|
0.028
|
0.56
|
0.5
|
10.85
|
16.97
|
2.1
|
0.003
|
0.027
|
In semiconductor manufacturing, maintaining ultra-high purity process gases is critical to prevent defects and ensure high yields. 1μm metal filter media play a vital role in gas purification by removing particulate contaminants while also contributing to Airborne Molecular Contamination (AMC) control, which is essential for advanced wafer fabrication.
High-Efficiency Filtration (1μm Retention)
Captures sub-micron particles that could cause defects in photolithography, etching, and deposition processes.
Reduces risk of wafer surface contamination, improving yield.
Chemically Inert & Corrosion-Resistant
Made from high-purity stainless steel (316L), nickel, or sintered alloys for compatibility with aggressive gases (e.g., HF, HCl, NH₃).
Resists outgassing, preventing additional contamination.
AMC Control Capability
Some advanced metal filters incorporate surface treatments or coatings (e.g., passivation, electropolishing) to minimize adsorption/desorption of volatile organics or acids.
Helps meet SEMI F21 AMC Class 1 requirements for sensitive processes like EUV lithography.
High Temperature & Pressure Resistance
Stable performance in harsh conditions (up to 500°C or higher for some alloys).
Suitable for CVD, diffusion, and ion implantation gas lines.
Long Service Life & Cleanability
Reusable after cleaning (ultrasonic, chemical, or thermal methods), reducing cost of ownership.
Low pressure drop design for energy-efficient gas flow.
Ultra-high purity (UHP) gas delivery (N₂, Ar, H₂, O₂, etc.)
Etch & deposition processes (CVD, PVD, ALD)
Photolithography (AMC-sensitive EUV/DUV environments)
Bulk gas & point-of-use (PoU) filtration
Superior durability vs. polymeric filters (which can degrade and shed particles).
No fiber shedding unlike traditional HEPA/ULPA filters.
Better AMC mitigation compared to standard particulate filters.
SEMI F20 (Particulate Control)
SEMI F21 (AMC Classification)
ISO 14644-1 (Cleanroom Standards)
1μm metal filter media is a robust solution for semiconductor gas purification, combining particulate filtration, AMC control, and chemical resistance to meet the stringent demands of advanced wafer fabrication.